AMMRF -

FEI Nova Nanolab 200 DualBeam FIB

Contact

Electron Microscope Unit, The University of New South Wales
Dr Charlie Kong, Research Associate
Tel: 02 9385 6395
Email: c.kong@unsw.edu.au

Capabilities

Advanced microscopy platform comprising high-performance electron and ion columns and analytical detectors for use in 2D and 3D microscopy, materials modification and fabrication of insulators, metals and semiconducting materials.

  • Implantation and nano-machining
  • Quantum Dots and arrays
  • Precise Surface Reconstructions
  • Select chemically regions for machining
  • Alternate between imaging and nanomilling
  • Single atom implantation, device prototyping or selective alloying
Characterisation
  • Nanoscale metrology: characterisation of micro devices (e.g.) recording heads, quantum computer, photonics, semiconductors
  • Engineering materials: new insights
Configuration
  • Dual-beam, featuring a scanning electron microscope
  • Focussed Ga source for ion machining and milling
  • Multi-source
  • Analytical capability (EDXS, EBSD)
  • Ion energy range: 5–30 keV
  • Ion beam current range: 1 pA to 20 nA
  • Ion beam min. diameter: approx. 10 nm
  • Electron column energy range: 0.5–30 keV
  • Electron column imaging resolution: 1 nm
Example image

Preparation of TEM specimen on interface between electrode and electrolyte in a fuel cell, resulting in an ultrathin section across electrode/electrolyte interface.

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