FEI Nova Nanolab 200 DualBeam FIB


Electron Microscope Unit, The University of New South Wales
Dr Charlie Kong, Research Associate
Tel: 02 9385 6395


Advanced microscopy platform comprising high-performance electron and ion columns and analytical detectors for use in 2D and 3D microscopy, materials modification and fabrication of insulators, metals and semiconducting materials.

  • Implantation and nano-machining
  • Quantum Dots and arrays
  • Precise Surface Reconstructions
  • Select chemically regions for machining
  • Alternate between imaging and nanomilling
  • Single atom implantation, device prototyping or selective alloying
  • Nanoscale metrology: characterisation of micro devices (e.g.) recording heads, quantum computer, photonics, semiconductors
  • Engineering materials: new insights
  • Dual-beam, featuring a scanning electron microscope
  • Focussed Ga source for ion machining and milling
  • Multi-source
  • Analytical capability (EDXS, EBSD)
  • Ion energy range: 5–30 keV
  • Ion beam current range: 1 pA to 20 nA
  • Ion beam min. diameter: approx. 10 nm
  • Electron column energy range: 0.5–30 keV
  • Electron column imaging resolution: 1 nm
Example image

Preparation of TEM specimen on interface between electrode and electrolyte in a fuel cell, resulting in an ultrathin section across electrode/electrolyte interface.


Flagship instruments

Cameca IMS 1280 Ion Probe
Cameca NanoSIMS 50 Ion Probe
The University of Western Australia

High-throughput cryo-TEM facility
The University of Queensland

Imago Local Electrode Atom Probes
The University of Sydney

FEI Nova NanoLab 200 DualBeam FIB
The University of New South Wales

FEI Helios NanoLab DualBeam FIB
The University of Adelaide; South Australian Regional Facility (SARF)

High-resolution SEM microanalysis facility
The University of New South Wales

University of South Australia; South Australian Regional Facility (SARF)