FEI Helios NanoLab DualBeam FIB
The next-generation focused ion beam / field-emission SEM instrument provides a platform for sub-nanometre resolution imaging with innovative machining capability. The instrument provides leading-edge capability with novel solutions to difficult sample preparation, 2-D and 3-D nanoanalysis and prototyping, and it adds to the nations capacity for this technology.
Applications include micro-machining and analysis of renewable energy 'sliver' technologies, applications for the defence industries, and in the prototype manufacture of laser hydrophones.
Image courtesy of FEI Company.